This product includes the following:
- Process Design Kit (PDK)—confidential, designed for Siemens L-Edit Photonics for the Advanced Micro Foundry (AMF) General-Purpose process. This PDK includes:
- A complete process layer definition
- Calibre design rule decks for Design Rule Check (DRC) to verify a design against the process specifications
- Device Library supplied by AMF for Silicon-verified Design, including Basic Programmable Cells and Black Box Cells
- Script of examples using User Programmable Interface (UPI) functions for creation of photonics device
- Preliminary Build-in DRC rules using L-Edit checker
- Component model for Lumerical Interconnect tool (in a future update)
- AMF documentation
- PDK User Guide—confidential, provides instructions for installing and configuring the PDK for Siemens L-Edit Photonics for the AMF General-Purpose process. It describes these tasks:
- Installation of Tanner and PDK
- Layout Creation using AMF Library
- Creating UPI Macros and Programmable T-Cells
- Run Tanner DRC at L-Edit During Layout Creation Process
- Importing and Exporting a Design
- Running a Calibre Design Rule Check at CMC Cloud
- Running Tiling scripts and Merging Layouts at CMC Cloud
- Layer Map and General Layout Rules
Related Product
AMF Silicon Photonics General-Purpose Fabrication Process
Related Document
Technical Report: AMF Wafer-Level Metrology PH2401, available on the FABrIC Portal (you need to be a FABrIC Member to access it).
Access to the PDK and the User Guide is restricted to CMC Microsystems account holders whose organization has a non-disclosure agreement (NDA) with CMC. The user is bound to maintain in strict confidence the AMF technology information received from CMC. For more information, contact the Licensing Administrator at licensing@cmc.ca.
