This document provides information about the research activities which have taken advantage of the fabrication services offered by CMC Microsystems during the 3rd quarter of fiscal year 2015/16 (October-December 2015).
How to Use This Report
Looking for an academic collaborator? The report describes designs that have progressed to fabrication for prototype purposes – providing a view into the research activities taking place at Canadian institutions and helping you uncover new opportunities. If you are interested in the designs, we encourage you to contact the researchers directly, or CMC Microsystems, Pat Botsford.
Table of Contents
Microelectronics
- 28-nanometre FD-SOI CMOS
- 65-nanometre CMOS
- 130-nanometre CMOS
- 180-nanometre CMOS
- 350-nanometre CMOS
Photonics/Optoelectronics
- Active Silicon on Insulator (SOI)
- III-V Epitaxy on GaAs Substrates
- III-V Epitaxy on InP Substrates
- III-V epitaxy on Ge Substrates
- Passive Silicon on Insulator (SOI) Course 2015 Designs
MEMS
- MIDIS™ Platform
Micro- Nano- Technology (MNT) Fabrication
- Examples of National Design Network projects utilizing Canadian Micro- Nano- Technology (MNT) fabrication facilities.
No part of this publication may be reproduced, stored in a retrieval system, or transmission in any form or by any means, electronic, mechanical, photocopying, recording, or likewise without the prior consent of CMC Microsystems. This publication reports and interprets data and news obtained by CMC Microsystems from sources thought to be reliable, but CMC Microsystems makes no warranty as to the accuracy and completeness.
