Prepared by Imed Zine-El-Abidine, Senior Applications Engineer, Microfabrication, CMC Microsystems.
This application note is intended for researchers accessing micro-nano technology facilities to create 3D structures for MEMS and microfluidic processes. This document describes a common approach to create gray scale masks: the clustered-dot-ordered-dither (CDOD) method.
This method is generally preferred by researchers who use standard lithography tools, because it takes less time to write the mask when compared to the 2D grating method. Another benefit is that surface topology design is constrained only by the resolution of the grey scale mask fabrication process.
This document is accompanied by dither code and step-by-step instructions that demonstrate how to implement this technique using Cadence layout design tools. It is intended to help users to get started more quickly.
Items available for download include:
- application note, and
- design file.
All CMC Microsystem account holders with a Subscription are authorized to access this application note. For more information contact Linda Dougherty at licensing@cmc.ca or 613-530-4787.
